We create patterned thin metal films and resin films (resists) on flexible substrates, including films and ultra-thin glass. Just as with standard glass substrates, we can achieve single-layer patterning and multilayer patterning (e.g., ITO/MAM/resist) according to your design specifications.

Common Flexible Substrates Used
Below are some of the typical flexible materials we handle. We can also perform patterning on specialized, custom-developed flexible substrates.
・PEN
・PET
・PI
・PC
・PES
・COP
・Thin Glass

Supported Sizes and Common Processing Layers
◆ Work Size: 100 × 100 mm
　・Thickness: Up to 0.1 mm
　・Mask Size: 7 inches
　・Line & Space: 2–3 μm

◆ Work Size: 150 × 150 mm

◆ Work Size: 200 × 200 mm
　・Mask Size: 9 inches

◆ Work Size: φ150 mm
　・Mask Size: 7 inches

◆ Work Size: φ200 mm
　・Mask Size: 9 inches

We also support other sizes for patterning. Please reach out via our contact form for details. Examples: φ300 mm (12-inch), □300 mm (12-inch), 130 × 110 mm, and custom shapes.

Metal Films (Photolithography + Etching)
・Aluminum, Aluminum Alloy (Al, Al-Nd)
・Transparent Conductive Film (P-ITO, a-ITO, IZO, ZnO)
・Chromium (Cr, CrO)
・Titanium (Ti)
・Molybdenum-based (Mo, MAM, MoNb)
・Gold (Au)
・Silver (Ag, APC)
・Copper (Cu, CuO)
・Nickel (Ni)
・Tungsten (W)
・Barium Titanate (BaTiO)

Resin Films (Photolithography)
・Novolac Resin
・Acrylic Resin
・Polyimide Resin
・Dry Film Resist (DFR)
・Color Filters (CF)
・Water-Repellent Banks
・Siloxane (Si-O-Si)

We support both negative and positive resist patterning.