Achieve the optimal plating environment at all times with the SACP-III full automation solution.

Overview
The SACP-III is an advanced automatic analysis and replenishment system that automates the optimal solution management in the nickel plating process. This system monitors the concentration of nickel sulfate, pH value, and the temperature of the plating solution in real-time, optimizing the plating process while maintaining consistent quality.

Features
Multifunctionality: Equipped with the ability to automatically measure and replenish up to five different chemicals, supporting the stability of the plating solution and the maintenance of film quality.
Continuous Monitoring: Continuously monitors the concentration of nickel sulfate, pH value, temperature during the process, and the temperature inside the plating tank, maintaining optimal conditions.
Data Management: Capable of printing out operational data and warning information, retaining data even in the event of a power outage.
User-Friendly: Features a touch panel operation and an easy-to-read LED display for intuitive control.
Specifications
The SACP-III is designed to improve the quality and efficiency of the plating process. Through automated chemical replenishment and continuous process monitoring, operators can constantly maintain the plating solution in an optimal state. This system contributes to productivity improvement and cost reduction while maintaining stable plating quality.

In the quality management of the plating process, the SACP-III is an essential tool for maintaining the optimal solution environment. This fully automated system ensures consistency in plating quality and process efficiency, contributing to the production of high-quality products.